SEM images

SEM images were taken at Harvard MRSEC facility using LEO 982 SEM

Si <111> wafer, oxidation at ~1000C for 2hours; HF etch 40sec.; NH4F 40% passivation 15 min.

Substrate used in March 98 Brookhaven run.

Si <111> wafer, as delivered; native oxide on laser polished wafer.

AFM images of the substrate used in March 98 Brookhaven run